The Project

It was required to control the movement of an object over a large stage of 2000 x 1000 mm which is also in motion with high accelerations. Due to the dynamics of the motion system it is required to be able to sustain extended misalignments on the movement of the moving arm, at the millimeters level. The solution must be able to endure strong acceleration patterns. In addition a version fully operational under high vacuum conditions is required.

Our Solution

The following implementation was developed: Two encoders, one of 2 m length and the second of 1 m length, in an active all implementation (active circuitry in both the scale and the read head) were developed. The solution is in production since 2007 with a vacuum compatible version in production since 2010.


The Customer

Semiconductors Wafer Handling Manufacturer

The performance of the product

Travel speed Up to 4 m/s
Resolution1 um
Accuracy± 15 μm
Repeatability2 um
Dynamic Position Z:1.2 ± 0.6 mm
Dynamic Position Y:0 ± 0.6 mm
Dynamic Position tilts, Rx, Ry, Rz:±5, ±3, ±3 mrad
Encoder InterfaceVarious Options
Temp range-40 to 115 ÷C
Permissible relative humidity<90% no condensation allowed
Resistance To shocksDIN IEC 68 part2 -27
Resistance To vibrationDIN IEC 68 part2 -6
Scale Width Up to25 mm
Measurement Range Up to2 m
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